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Effect of in situ ultraviolet irradiation on the formation of nanostructural carbon nitride films
Author(s) -
Shalaev R. V.,
Prudnikov A. M.,
Ulyanov A. N.,
Shin G. M.,
Yoo S. I.,
Linnik A. I.,
Linnik T. A.,
Burkhovetskii V. V.,
Varyukhin V. N.
Publication year - 2012
Publication title -
physica status solidi (a)
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.532
H-Index - 104
eISSN - 1862-6319
pISSN - 1862-6300
DOI - 10.1002/pssa.201228069
Subject(s) - materials science , x ray photoelectron spectroscopy , irradiation , ultraviolet , amorphous solid , scanning electron microscope , substrate (aquarium) , amorphous carbon , carbon nitride , chemical engineering , carbon fibers , graphite , sputter deposition , etching (microfabrication) , nanostructure , sputtering , analytical chemistry (journal) , nanotechnology , thin film , composite material , catalysis , optoelectronics , photocatalysis , chemistry , crystallography , layer (electronics) , oceanography , composite number , chromatography , nuclear physics , physics , geology , engineering , biochemistry
We report the effect of in situ ultraviolet (UV) irradiation on the formation of carbon nitride CN x films. The nanocolumnar films were produced under UV irradiation without a metal catalyst by dc magnetron sputtering of a graphite target in an N 2 atmosphere with 3% of O 2 on a quartz glass substrate. It was shown that films have dense nanostructure with columns of 60–80 nm in diameter and with nitrogen concentration of ∼4%. Scanning electron microscopy (SEM) and X‐ray photoemission spectroscopy (XPS) data show the coexistence of amorphous and columnar phases. In situ UV irradiation was found to be effective for growing the pure nanocolumnar structure of carbon nitride by etching the amorphous phase.