Synthesis and characterization of Al– M g– Z n thin film alloys co‐deposited from vapour phase

Mg–Zn thin film alloys were produced by thermal co‐evaporation using single source and dual source geometries. The films containing high amount of Zn (66 at.%) were prone to formation of metallic micro spheres on the surface when high evaporation rates (10 nm s −1 ) were used. The Mg–27.1 at.% Zn bulk alloy was found to be suitable for co‐deposition with Al for producing Al–Mg–Zn thin film alloys. A low Al concentration gradient (5 at.%) could be obtained along the sample due to the high deposition rates of Mg–Zn (7.5 nm s −1 ) combined with low Al deposition rates (0.2 nm s −1 ). The Al–Mg–Zn thin films showed an improved resistance against chemical attack when higher amounts of Al are used, as shown by downstream analytics investigations using a flat flow electrochemical cell coupled to an AAS system.