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Synthesis and characterization of Al– M g– Z n thin film alloys co‐deposited from vapour phase
Author(s) -
Voith Michael,
Mardare Andrei I.,
Hassel Achim Walter
Publication year - 2013
Publication title -
physica status solidi (a)
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.532
H-Index - 104
eISSN - 1862-6319
pISSN - 1862-6300
DOI - 10.1002/pssa.201200742
Subject(s) - materials science , thin film , deposition (geology) , evaporation , alloy , analytical chemistry (journal) , metal , phase (matter) , metallurgy , chemistry , nanotechnology , paleontology , physics , organic chemistry , sediment , biology , thermodynamics , chromatography
Mg–Zn thin film alloys were produced by thermal co‐evaporation using single source and dual source geometries. The films containing high amount of Zn (66 at.%) were prone to formation of metallic micro spheres on the surface when high evaporation rates (10 nm s −1 ) were used. The Mg–27.1 at.% Zn bulk alloy was found to be suitable for co‐deposition with Al for producing Al–Mg–Zn thin film alloys. A low Al concentration gradient (5 at.%) could be obtained along the sample due to the high deposition rates of Mg–Zn (7.5 nm s −1 ) combined with low Al deposition rates (0.2 nm s −1 ). The Al–Mg–Zn thin films showed an improved resistance against chemical attack when higher amounts of Al are used, as shown by downstream analytics investigations using a flat flow electrochemical cell coupled to an AAS system.