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Structural and optical properties of electrochemically deposited ZnO films in electrolyte containing Al 2 (SO 4 ) 3
Author(s) -
Lovchinov Konstantin,
Ganchev Maxim,
Petrov Miroslav,
Nichev Hristo,
Rachkova Avgustina,
Angelov Orlin,
Mikli Valdek,
DimovaMalinovska Doriana
Publication year - 2013
Publication title -
physica status solidi (a)
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.532
H-Index - 104
eISSN - 1862-6319
pISSN - 1862-6300
DOI - 10.1002/pssa.201200558
Subject(s) - materials science , scanning electron microscope , saturated calomel electrode , thin film , electrode , analytical chemistry (journal) , deposition (geology) , electrochemistry , electrolyte , chemical engineering , nanotechnology , working electrode , composite material , chemistry , paleontology , chromatography , sediment , engineering , biology
The present work concerns the electrochemical deposition of aluminum‐doped ZnO nanostructured thin films on SnO 2 :F‐covered glass substrates. Doped with Al nanostructured ZnO (ZnO:Al) films are obtained by an electrochemical process using a three‐electrode potentiostatic system with a saturated calomel electrode as reference electrode, in aqueous solution containing ZnCl 2 , KCl, and Al 2 (SO 4 ) 3 . The influence of the deposition parameters on the structural properties of the obtained ZnO:Al layers is investigated by scanning electron microscopy (SEM), X‐ray diffraction (XRD) and atomic force microscopy (AFM). Energy‐dispersive X‐ray analysis (EDAX) is applied for measurement of the Al content in the films. The SEM micrographs and AFM pictures show that the ZnO:Al films consist of nanograins with a shape of walls. The XRD spectra demonstrate the characteristic (100), (002), (101), (110), and (103) reflections of the ZnO. The influence of the Al concentration on the IR reflectance spectra and the haze ratio of ZnO:Al thin films are presented and discussed.