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The effect of oxygen flow rates on magnetic and high‐frequency characteristics of Fe‐Hf‐O films
Author(s) -
Wang ZongShenq,
Lai YuanTai,
Duh JenqGong
Publication year - 2012
Publication title -
physica status solidi (a)
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.532
H-Index - 104
eISSN - 1862-6319
pISSN - 1862-6300
DOI - 10.1002/pssa.201127500
Subject(s) - nanocrystalline material , materials science , ferromagnetic resonance , amorphous solid , analytical chemistry (journal) , ferromagnetism , volumetric flow rate , sputter deposition , oxygen , thin film , sputtering , saturation (graph theory) , nuclear magnetic resonance , magnetization , condensed matter physics , chemistry , nanotechnology , magnetic field , crystallography , thermodynamics , physics , mathematics , organic chemistry , chromatography , quantum mechanics , combinatorics
This study aimed to investigate the influence of oxygen flow rate on magnetic and high‐frequency properties of as‐deposited FeHfO thin films, which were fabricated by DC reactive magnetron sputtering in an Ar + O 2 atmosphere. These films exhibited mixed phases of α‐Fe nanograins and amorphous HfO 2 phase, showing nanocrystalline structure and soft magnetic properties. The dispersion character of FeHfO films changed from relaxation‐type to resonance‐type when the oxygen flow rate varied from 1.0 to 1.2 sccm. Furthermore, the Fe 58.8 Hf 13.1 O 28.1 film with the optimum O 2 flow rate of 1.2 sccm exhibited high saturation magnetization of 10.6 kG, a high resistivity of 258 µΩ cm, a real component of permeability ( µ ′) of 250 up to 1 GHz and a high ferromagnetic resonance frequency of 2.5 GHz. It is expected that this film should be promising for practical applications as a high‐frequency ferromagnetic material.