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Catalyst‐free growth of InN nanorods by metal‐organic chemical vapor deposition
Author(s) -
Kim Min Hwa,
Moon Dae Young,
Park Jinsub,
Nanishi Yasushi,
Yi GyuChul,
Yoon Euijoon
Publication year - 2012
Publication title -
physica status solidi (a)
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.532
H-Index - 104
eISSN - 1862-6319
pISSN - 1862-6300
DOI - 10.1002/pssa.201100124
Subject(s) - nanorod , chemical vapor deposition , nanostructure , indium , materials science , desorption , chemical engineering , deposition (geology) , nanotechnology , catalysis , metal , chemistry , optoelectronics , metallurgy , adsorption , organic chemistry , paleontology , sediment , engineering , biology
We demonstrated the growth of catalyst‐free InN nanostructures including nanorods on (0001) Al 2 O 3 substrates using metal‐organic chemical vapor deposition. As the growth time increased, growth rate along c ‐direction increased superlinearly with decreasing c ‐plane area fractions and increasing side wall areas. It was also found that desorption from the sidewalls of InN nanostructures during the InN nanorods formation was one of essential key parameters of the growth mechanism. We propose a growth model to explain the InN nanostructure evolution by considering the side wall desorption and re‐deposition of indium at top c ‐plane surfaces.