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Fabrication of adherent porous diamond films on sintered WC‐13 wt.%Co substrates by bias enhanced hot filament chemical vapour deposition
Author(s) -
Wei Q.,
Ashfold M. N. R.,
Yu Z. M.,
Ma L.
Publication year - 2011
Publication title -
physica status solidi (a)
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.532
H-Index - 104
eISSN - 1862-6319
pISSN - 1862-6300
DOI - 10.1002/pssa.201100007
Subject(s) - materials science , chemical vapor deposition , scanning electron microscope , diamond , raman spectroscopy , porosity , rockwell scale , x ray photoelectron spectroscopy , composite material , material properties of diamond , fabrication , chemical engineering , nanotechnology , optics , medicine , physics , alternative medicine , engineering , pathology
Abstract Porous diamond (PD) films have been grown on sintered WC‐13 wt.%Co substrates by bias enhanced hot filament (HF) chemical vapour deposition (CVD) methods and characterized by scanning electron microscopy (SEM), laser Raman spectroscopy and X‐ray diffraction (XRD). The PD films show excellent adhesion under Rockwell indentation testing. Factors encouraging the growth of diamond film with high porosity are discussed.