A study on the graphene incorporated direct‐patternable SnO 2 thin film

The electrical property of direct‐patternable SnO 2 thin film was improved by the incorporation of graphene. Graphene were incorporated into SnO 2 photosensitive solution and the direct‐patternable film was prepared by photochemical solution deposition. The incorporation of graphene into SnO 2 films slightly reduced the transmittance of the films due to light scattering by the incorporated graphene. In addition, with incorporation of graphene, the crystallinity of the SnO 2 thin films was decreased slightly and the resistivity was improved due to an enhancement of mobility because of the π‐bond nature of surface on graphene. Direct‐patterning of graphene incorporated SnO 2 thin films was performed without photoresist or etching process. These results suggest that a micropatterned system can be simply fabricated at a low cost and the electrical properties of SnO 2 films can be improved by incorporating graphene.