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Ultrathin chromium transparent metal contacts by pulsed dc magnetron sputtering
Author(s) -
Rajani K. V.,
Daniels S.,
McNally P. J.,
Lucas F. Olabanji,
Alam M. M.
Publication year - 2010
Publication title -
physica status solidi (a)
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.532
H-Index - 104
eISSN - 1862-6319
pISSN - 1862-6300
DOI - 10.1002/pssa.200983732
Subject(s) - materials science , optoelectronics , annealing (glass) , pulsed dc , sputter deposition , sputtering , electrical resistivity and conductivity , chromium , diode , high power impulse magnetron sputtering , cavity magnetron , thin film , nanotechnology , composite material , metallurgy , electrical engineering , engineering
Optoelectronic technology frequently demands optically transparent materials. In this paper we present an overview of the development of ultrathin chromium films of above 80% optical transparency and 10 2 –10 3 µΩ cm resistivity using bipolar pulsed dc magnetron sputtering. The surface morphology and film resistivity are investigated using atomic force microscopy (AFM) and four point probe, respectively. The variation of the electrical properties of the film with thickness, pulse duty cycle and target power are examined. An optimal experimental condition is suggested for developing transparent metal contacts, which can be used for the realisation of optoelectronic devices including organic light‐emitting diodes on flexible, low cost polymeric substrates. This process does not require high temperature and post‐deposition annealing unlike other transparent conducting oxides.