Site‐selective anodic etching of InP substrate using self‐organized spheres as mask | Zendy

Yokoyama Takayuki | Zendy; Asoh Hidetaka | Zendy; Ono Sachiko | Zendy

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Site‐selective anodic etching of InP substrate using self‐organized spheres as mask

Author(s) -

Yokoyama Takayuki,

Asoh Hidetaka,

Ono Sachiko

Publication year - 2010

Publication title -

physica status solidi (a)

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.532

H-Index - 104

eISSN - 1862-6319

pISSN - 1862-6300

DOI - 10.1002/pssa.200925595

Subject(s) - materials science , etching (microfabrication) , substrate (aquarium) , isotropic etching , layer (electronics) , polystyrene , sputtering , anode , reactive ion etching , nanotechnology , chemical engineering , optoelectronics , composite material , electrode , thin film , chemistry , oceanography , engineering , geology , polymer

Ordered microstructures were formed on an InP substrate by metal‐assisted chemical etching or anodic etching using a layer of colloidal crystals consisting of polystyrene spheres as a mask. When the metal‐assisted chemical etching of the InP substrate was carried out in a mixed solution of H 2 SO 4 /H 2 O 2 using a Pt honeycomb pattern as a catalyst, obtained by ion sputtering through the mask on the substrate, InP column arrays with a close‐packed configuration having an ordered periodicity were formed. Furthermore, by anodic etching at the optimum HCl concentration with a layer of colloidal crystals as a mask, InP disk arrays or pillar arrays were fabricated.

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