z-logo
Premium
Structural, optical, and electrical properties of n‐ZnO/p‐GaAs heterojunction
Author(s) -
Tekmen Süleyman,
Gür Emre,
Asıl Hatice,
Çınar Kübra,
Coşkun Cevdet,
Tüzemen Sebahattin
Publication year - 2010
Publication title -
physica status solidi (a)
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.532
H-Index - 104
eISSN - 1862-6319
pISSN - 1862-6300
DOI - 10.1002/pssa.200925488
Subject(s) - heterojunction , photoluminescence , materials science , rectification , substrate (aquarium) , optoelectronics , thin film , diode , diffraction , ultraviolet , voltage , optics , nanotechnology , electrical engineering , oceanography , physics , geology , engineering
n‐ZnO film grown by electrodeposition (ECD) on p‐GaAs substrate was characterized by structural, optical, and electrical techniques. X‐ray diffraction (XRD) measurement clearly showed formation of ZnO thin film with a strong c ‐axis (0002) preferential orientation. Photoluminescence (PL) measurements showed that the grown film has a strong and narrow ultraviolet (UV) emission indicating high‐quality ZnO thin film. Current–voltage ( I – V ) measurement of n‐ZnO/p‐GaAs heterojunction shows diode‐like rectifying characteristics with an almost five‐order rectification factor and a turn‐on voltage of 2 V.

This content is not available in your region!

Continue researching here.

Having issues? You can contact us here
Accelerating Research

Address

John Eccles House
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom