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The effect of rapid thermal annealing on characteristics of carbon coatings on optical fibers
Author(s) -
Yu JenFeng,
Chen TsuenSung,
Lin HungChien,
Shiue ShamTsong
Publication year - 2010
Publication title -
physica status solidi (a)
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.532
H-Index - 104
eISSN - 1862-6319
pISSN - 1862-6300
DOI - 10.1002/pssa.200925345
Subject(s) - materials science , annealing (glass) , plasma enhanced chemical vapor deposition , carbon film , composite material , surface roughness , band gap , chemical vapor deposition , chemical engineering , thin film , nanotechnology , optoelectronics , engineering
Carbon films are deposited on silica glass fibers by radio‐frequency plasma‐enhanced chemical vapor deposition (rf‐PECVD), and the properties of these optical fibers are improved by rapid thermal annealing. The annealing temperatures are set to 100, 200, 300, 400, 500, 550, 600, and 700 °C. Experimental results show that the thickness and surface roughness of carbon films decrease with increasing annealing temperature, ranging from as‐deposited to 500 °C, while the sp 2 carbon bonding, sp 3 CH 3 bonding, optical bandgap, and water contact angle (CA) of carbon films increase. As the annealing temperature increases from 550 to 700 °C, parts of the carbon films are delaminated. The sp 3 CH 3 bonding in carbon films is shifted to the sp 3 CH 2 bonding, and the sp 3 CH 2 bonding is subsequently transferred to the sp 2 CH bonding. Meanwhile, the amount of the sp 2 carbon bonding in carbon films increases, while the optical bandgap decreases. Based on the evaluation of water repellency and low‐temperature morphology of carbon films, the carbon film annealed at a temperature of 500 °C is the best for production of carbon‐coated optical fibers. As compared to conventional thermal annealing (CTA), rapid thermal annealing (RTA) is more effective to improve the properties of carbon‐coated optical fibers.