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Monolithic self‐sustaining nanographene sheet grown using plasma‐enhanced chemical vapor deposition
Author(s) -
Takeuchi Wakana,
Takeda Keigo,
Hiramatsu Mineo,
Tokuda Yutaka,
Kano Hiroyuki,
Kimura Shigeru,
Sakata Osami,
Tajiri Hiroo,
Hori Masaru
Publication year - 2010
Publication title -
physica status solidi (a)
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.532
H-Index - 104
eISSN - 1862-6319
pISSN - 1862-6300
DOI - 10.1002/pssa.200925230
Subject(s) - chemical vapor deposition , raman spectroscopy , materials science , crystallinity , chemical engineering , substrate (aquarium) , electrical resistivity and conductivity , x ray photoelectron spectroscopy , plasma processing , deposition (geology) , semiconductor , carbon fibers , plasma enhanced chemical vapor deposition , plasma , analytical chemistry (journal) , nanotechnology , optoelectronics , composite material , chemistry , organic chemistry , optics , composite number , oceanography , engineering , biology , paleontology , quantum mechanics , physics , sediment , electrical engineering , geology
Abstract We have fabricated carbon nanowalls (CNWs) composed of monolithic self‐sustaining nanographene sheets standing vertically on a Si substrate, using plasma‐enhanced chemical vapor deposition with a C 2 F 6 /H 2 mixture. The crystallinity, evaluated by Raman spectroscopy and synchrotron X‐ray surface diffraction, and the electrical properties of the CNWs were improved by introducing O 2 gas into the source gas mixture during the CNW growth process. The temperature dependence of the resistivity of the CNW films exhibited semiconductor behavior.