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Structural and optical properties of electron‐beam evaporated Al 2 O 3 ‐doped V 2 O 5 thin films for various applications
Author(s) -
Ali H. M.,
Hakeem A. M. Abdel
Publication year - 2010
Publication title -
physica status solidi (a)
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.532
H-Index - 104
eISSN - 1862-6319
pISSN - 1862-6300
DOI - 10.1002/pssa.200925121
Subject(s) - materials science , refractive index , annealing (glass) , thin film , doping , transmittance , electron beam physical vapor deposition , analytical chemistry (journal) , band gap , optics , optoelectronics , chemistry , nanotechnology , physics , chromatography , composite material
The solid‐state reaction method was used to prepare tablets of (V 2 O 5 ) 100− x (Al 2 O 3 ) x with x = 5, 10, 15, 20 wt. %. Thin films of Al 2 O 3 ‐doped V 2 O 5 were deposited onto glass substrates using an electron‐beam evaporation technique. The influence of doping and annealing temperature on the structural and optical characteristics has been investigated in detail. Optical properties of the films were studied extensively in the wavelength range 200–2500 nm from the measurements of the optical transmittance ( T ) and optical reflectance ( R ). It was observed that the optical properties such as transmittance, reflectance, optical bandgap, and refractive index of (V 2 O 5 ) 100− x (Al 2 O 3 ) x films were strongly affected by the ratio of Al 2 O 3 and the temperature of annealing.