Premium
New approach for the selective chemical functionalization of porous silicon films with organic monolayers
Author(s) -
Pace Stéphanie,
Gazagnes Laetitia,
Gonzalez Philippe,
Guimon Claude,
Granier Michel,
Cot Didier,
Devoisselle JeanMarie,
Cunin Frédérique
Publication year - 2009
Publication title -
physica status solidi (a)
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.532
H-Index - 104
eISSN - 1862-6319
pISSN - 1862-6300
DOI - 10.1002/pssa.200881080
Subject(s) - hydrosilylation , monolayer , surface modification , silicon , alkene , porous silicon , materials science , silanization , covalent bond , hydrofluoric acid , chemical modification , chemical engineering , organosilicon , molecule , polymer chemistry , organic chemistry , nanotechnology , chemistry , catalysis , engineering
A new approach for the selective chemical modification of porous silicon surfaces with organic monolayers is reported. The organic layers are first covalently grafted onto (100) surface of hydrogen terminated silicon via thermal hydrosilylation of alkene or functionalized alkene molecules yielding stable monolayers on flat Si surfaces. The functionalized silicon surfaces are then electrochemically etched in a hydrofluoric acid solution. (© 2009 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)