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Effects of Fe 3 O 4 underlayer on the annealing temperature of CoFe 2 O 4 thin films
Author(s) -
Zhong Zhiyong,
Zhang Huaiwu,
Tang Xiaoli,
Jing Yulan,
Jia Lijun,
Liu Shuang
Publication year - 2009
Publication title -
physica status solidi (a)
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.532
H-Index - 104
eISSN - 1862-6319
pISSN - 1862-6300
DOI - 10.1002/pssa.200824370
Subject(s) - annealing (glass) , coercivity , materials science , grain size , thin film , sputter deposition , microstructure , analytical chemistry (journal) , cobalt , metallurgy , condensed matter physics , sputtering , nanotechnology , chemistry , physics , chromatography
CoFe 2 O 4 films of 100 nm thickness were deposited on 20 nm, rf magnetron‐sputtered Fe 3 O 4 underlayers on naturally oxidized Si (100) substrates. These films were then annealed, and the magnetic properties and microstructures were investigated as a function of annealing temperature. Results show that the optimum annealing temperature to obtain the maximum coercivity decreases from 700 °C for films without Fe 3 O 4 underlayers to 500 °C for films with underlayers. The decreased annealing temperature corresponds to a phase transformation of the Fe 3 O 4 underlayers at about 400–500 °C, which accelerates the increase in grain size of the cobalt ferrite films. (© 2009 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)