Effects of Fe 3 O 4  underlayer on the annealing temperature of CoFe 2 O 4  thin films | Zendy

Zhong Zhiyong | Zendy; Zhang Huaiwu | Zendy; Tang Xiaoli | Zendy; Jing Yulan | Zendy; Jia Lijun | Zendy; Liu Shuang | Zendy

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Effects of Fe 3 O 4 underlayer on the annealing temperature of CoFe 2 O 4 thin films

Author(s) -

Zhong Zhiyong,

Zhang Huaiwu,

Tang Xiaoli,

Jing Yulan,

Jia Lijun,

Liu Shuang

Publication year - 2009

Publication title -

physica status solidi (a)

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.532

H-Index - 104

eISSN - 1862-6319

pISSN - 1862-6300

DOI - 10.1002/pssa.200824370

Subject(s) - annealing (glass) , coercivity , materials science , grain size , thin film , sputter deposition , microstructure , analytical chemistry (journal) , cobalt , metallurgy , condensed matter physics , sputtering , nanotechnology , chemistry , physics , chromatography

CoFe 2 O 4 films of 100 nm thickness were deposited on 20 nm, rf magnetron‐sputtered Fe 3 O 4 underlayers on naturally oxidized Si (100) substrates. These films were then annealed, and the magnetic properties and microstructures were investigated as a function of annealing temperature. Results show that the optimum annealing temperature to obtain the maximum coercivity decreases from 700 °C for films without Fe 3 O 4 underlayers to 500 °C for films with underlayers. The decreased annealing temperature corresponds to a phase transformation of the Fe 3 O 4 underlayers at about 400–500 °C, which accelerates the increase in grain size of the cobalt ferrite films. (© 2009 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)

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