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Optical properties of MOCVD HfO 2 films
Author(s) -
Ayupov Boris,
Zherikova Kseniya,
Gelfond Nikolai,
Morozova Natalia
Publication year - 2009
Publication title -
physica status solidi (a)
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.532
H-Index - 104
eISSN - 1862-6319
pISSN - 1862-6300
DOI - 10.1002/pssa.200824250
Subject(s) - metalorganic vapour phase epitaxy , refractive index , ellipsometry , annealing (glass) , hafnium , materials science , monochromatic color , anisotropy , thin film , optoelectronics , analytical chemistry (journal) , optics , chemistry , nanotechnology , physics , composite material , metallurgy , zirconium , epitaxy , layer (electronics) , chromatography
Hafnium(IV) 2,2,6,6‐tetramethylheptane‐3,5‐dionate Hf(thd) 4 was used for depositing HfO 2 coatings by MOCVD in vertical reactor in different conditions. Monochromatic null ellipsometry was applied to characterize the film thickness and refractive index using different optical model of samples. The definition of sample optical anisotropy points to the growth of HfO 2 nanocrystals during film annealing. (© 2009 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)