Premium
Efficient infrared emission from patterned thin metal films on a Si photonic crystal
Author(s) -
Theodoni P.,
Vamvakas V. Em.,
Speliotis Th.,
Chatzichristidi M.,
Bayiati P.,
Raptis I.,
Papanikolaou N.
Publication year - 2008
Publication title -
physica status solidi (a)
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.532
H-Index - 104
eISSN - 1862-6319
pISSN - 1862-6300
DOI - 10.1002/pssa.200780200
Subject(s) - materials science , infrared , photonic crystal , thin film , optoelectronics , lattice constant , lithography , fourier transform infrared spectroscopy , metal , substrate (aquarium) , infrared spectroscopy , optics , scattering , wavelength , nanotechnology , diffraction , chemistry , physics , oceanography , organic chemistry , geology , metallurgy
Abstract We study the infrared optical response of periodically patterned thin metal films on a Si photonic crystal using Fourier‐transform infrared spectroscopy and full electrodynamic calculations. Thin metallic films on top of Si substrate were patterned using optical lithography; furthermore the Si substrate was etched, using the metal as a mask. The structures have a narrow band absorption spectrum for wavelengths close to the lattice constant of the patterning. Both Al and Au films gave similar infrared response. Our results can be explained by multiple scattering electrodynamic simulations. (© 2008 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)