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Effects of surface pretreatment on growth of ZnO on glass substrate
Author(s) -
Makino Hisao,
Kishimoto Seiichi,
Yamada Takahiro,
Miyake Aki,
Yamamoto Naoki,
Yamamoto Tetsuya
Publication year - 2008
Publication title -
physica status solidi (a)
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.532
H-Index - 104
eISSN - 1862-6319
pISSN - 1862-6300
DOI - 10.1002/pssa.200778912
Subject(s) - crystallite , substrate (aquarium) , materials science , morphology (biology) , atomic layer deposition , layer (electronics) , thin film , chemical engineering , perpendicular , deposition (geology) , nanotechnology , composite material , metallurgy , paleontology , oceanography , geometry , mathematics , sediment , biology , engineering , genetics , geology
Polycrystalline undoped ZnO thin films were deposited on glass substrates by atomic layer deposition (ALD). Effects of surface pretreatments prior to the ALD growth have been investigated. In the relationship between grown film thickness and number of ALD cycles, an incubation period in which film growth is strongly suppressed up to the initial several tens of ALD cycles was observed. Such an incubation period was longer for the hexamethyldisilazane (HMDS) pretreated case compared to the others. Surface morphology and in‐plane crystalline size were also affected by the surface pretreatment. Rough surface morphology and larger crystalline size were observed in the films grown on the HMDS treated substrates. All of the films studied here were polycrystalline with nearly random orientations, but the thin films showed a weak preferential orientation of the c ‐axis perpendicular to the substrate surface. Evolution of the orientation with the film thickness was also affected by the surface pretreatments. (© 2008 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)