Effect of substrate temperature on the photocatalytic activity of sputtered TiO 2  thin film | Zendy

Hossain M. F. | Zendy; Biswas S. | Zendy; Takahashi T. | Zendy; Kubota Y. | Zendy; Fujishima A. | Zendy

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Effect of substrate temperature on the photocatalytic activity of sputtered TiO 2 thin film

Author(s) -

Hossain M. F.,

Biswas S.,

Takahashi T.,

Kubota Y.,

Fujishima A.

Publication year - 2008

Publication title -

physica status solidi (a)

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.532

H-Index - 104

eISSN - 1862-6319

pISSN - 1862-6300

DOI - 10.1002/pssa.200778892

Subject(s) - crystallinity , photocatalysis , substrate (aquarium) , materials science , thin film , chemical engineering , decomposition , sputter deposition , surface roughness , sputtering , irradiation , analytical chemistry (journal) , composite material , nanotechnology , catalysis , chemistry , chromatography , organic chemistry , oceanography , physics , nuclear physics , engineering , geology

In this investigation, transparent TiO 2 films were deposited at various substrate temperatures: RT, 200 °C, 300 °C and 400 °C by DC reactive magnetron sputtering technique to study the photocatalytic activity by the measurement of decomposition of methanol under UV–visible irradiation. The decomposition efficiency of TiO 2 film increases initially with the increase of substrate temperature to 200 °C, but it decreases for the higher substrate temperatures. The correlation between the photocatalytic activity and the crystallographic, optical and morphological properties of TiO 2 thin films was investigated in detail. Results show that increase of substrate temperature enhances crystallinity but reduces surface roughness. (© 2008 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)

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