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Effect of substrate temperature on the photocatalytic activity of sputtered TiO 2 thin film
Author(s) -
Hossain M. F.,
Biswas S.,
Takahashi T.,
Kubota Y.,
Fujishima A.
Publication year - 2008
Publication title -
physica status solidi (a)
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.532
H-Index - 104
eISSN - 1862-6319
pISSN - 1862-6300
DOI - 10.1002/pssa.200778892
Subject(s) - crystallinity , photocatalysis , substrate (aquarium) , materials science , thin film , chemical engineering , decomposition , sputter deposition , surface roughness , sputtering , irradiation , analytical chemistry (journal) , composite material , nanotechnology , catalysis , chemistry , chromatography , organic chemistry , oceanography , physics , nuclear physics , engineering , geology
In this investigation, transparent TiO 2 films were deposited at various substrate temperatures: RT, 200 °C, 300 °C and 400 °C by DC reactive magnetron sputtering technique to study the photocatalytic activity by the measurement of decomposition of methanol under UV–visible irradiation. The decomposition efficiency of TiO 2 film increases initially with the increase of substrate temperature to 200 °C, but it decreases for the higher substrate temperatures. The correlation between the photocatalytic activity and the crystallographic, optical and morphological properties of TiO 2 thin films was investigated in detail. Results show that increase of substrate temperature enhances crystallinity but reduces surface roughness. (© 2008 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)