Influence of tantalum dopant ions (Ta 5+ ) on the efficiency of the tungsten trioxide photoelectrode | Zendy

Enesca A. | Zendy; Duta A. | Zendy; Schoonman J. | Zendy

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Influence of tantalum dopant ions (Ta 5+ ) on the efficiency of the tungsten trioxide photoelectrode

Author(s) -

Enesca A.,

Duta A.,

Schoonman J.

Publication year - 2008

Publication title -

physica status solidi (a)

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.532

H-Index - 104

eISSN - 1862-6319

pISSN - 1862-6300

DOI - 10.1002/pssa.200778858

Subject(s) - tungsten trioxide , dopant , photocurrent , materials science , doping , tantalum , photoluminescence , inorganic chemistry , electrolyte , tin oxide , tungsten , chemistry , optoelectronics , metallurgy , electrode

The paper presents the influence of the tantalum dopant ions (Ta 5+ ) on the properties of WO 3 film, used as photoelectrode for water photolysis. The photoluminescence and photocurrent stability were recorded in a photoelectrochemical system having doped and, respectively, undoped WO 3 films, deposited by spray pyrolysis on fluorine–doped tin oxide as photoanode and Pt as cathode, in electrolyte HCl (pH = 5). The crystalline structure, topography and electrical properties were investigated. The experiments confirm that the doping process double the photoelectrode efficiency. (© 2008 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)

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