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Enhancement in ellipsometric thin film sensitivity near surface plasmon resonance conditions
Author(s) -
Arwin H.,
Poksinski M.,
Johansen K.
Publication year - 2008
Publication title -
physica status solidi (a)
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.532
H-Index - 104
eISSN - 1862-6319
pISSN - 1862-6300
DOI - 10.1002/pssa.200777899
Subject(s) - ellipsometry , materials science , sensitivity (control systems) , surface plasmon resonance , thin film , surface plasmon , optics , resonance (particle physics) , plasmon , radiation , reflection (computer programming) , reflectivity , inverse , optoelectronics , physics , nanotechnology , atomic physics , nanoparticle , mathematics , geometry , electronic engineering , computer science , engineering , programming language
Ellipsometry used in internal reflection mode exhibits enhanced thin film sensitivity if operated close to surface plasmon resonance conditions. Compared to conventional ellipsometry, the changes in the ellipsometric parameter Δ are several orders of magnitude larger. Here, the origin of this large sensitivity is discussed by analysing thin film approximations of the complex reflectance ratio. It is found that the thickness sensitivity in Δ is proportional to the inverse of the difference between the intrinsic and the radiation‐induced damping of the surface plasmons. (© 2008 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)