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Immersion scatterometry for improved nano‐scale topography measurements
Author(s) -
Liu Elson,
Terry Fred L.
Publication year - 2008
Publication title -
physica status solidi (a)
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.532
H-Index - 104
eISSN - 1862-6319
pISSN - 1862-6300
DOI - 10.1002/pssa.200777756
Subject(s) - critical dimension , immersion (mathematics) , specular reflection , nano , materials science , nanoscopic scale , optics , optoelectronics , nanotechnology , physics , composite material , mathematics , pure mathematics
Abstract Spectroscopic ellipsometry measurement of periodic structures (“scatterometry”) has become a standard method for critical dimension and topography measurement in the integrated circuit industry. As dimensions are reduced, this method may not be adequate for research and process control. Use of immersion mode measurements may extend the usefulness of near UV specular scatterometry. In this paper, we present the first experimental measurements of gratings in water immersion and discuss the issues in achieving improved nano‐topography measurements with this method. (© 2008 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)