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Ultrasoft magnetic properties of Co–Fe–Hf–O nanocomposite films
Author(s) -
Ha N. D.,
Phan M. H.,
Tuan L. A.,
Phan T. L.,
Kim C. G.,
Kim C. O.,
Yu S. C.
Publication year - 2007
Publication title -
physica status solidi (a)
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.532
H-Index - 104
eISSN - 1862-6319
pISSN - 1862-6300
DOI - 10.1002/pssa.200777173
Subject(s) - coercivity , materials science , electrical resistivity and conductivity , saturation (graph theory) , ferromagnetism , magnetization , nanocomposite , anisotropy , magnetic anisotropy , permeability (electromagnetism) , sputtering , thin film , condensed matter physics , nuclear magnetic resonance , magnetic field , analytical chemistry (journal) , nanotechnology , chemistry , electrical engineering , optics , physics , biochemistry , mathematics , combinatorics , quantum mechanics , chromatography , membrane , engineering
This paper reports on the excellent high‐frequency magnetic performance of Co–Fe–Hf–O thin films, which were deposited on Si(100) substrates by the oxygen reactive rf‐sputtering method. It was shown that the films possessed not only high electrical resistivity but also large saturation magnetization and hard‐axis anisotropy field. Among the compositions investigated, Co 19.35 Fe 53.28 Hf 7.92 O 19.35 exhibited the ultrasoft magnetic properties of high saturation magnetization, 4π M s ∼19.86 kG, and low coercivity, H c ∼1.5 Oe. The magnetic permeability remained almost constant up to 3 GHz and reached a maximum at the ferromagnetic resonant frequency of 4.024 GHz. These properties of this film together with a high electrical resistivity of 3569 μΩcm make it ideal for producing micromagnetic devices for high‐frequency applications. (© 2008 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)