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pH sensitivity of nanocrystalline diamond films
Author(s) -
Christiaens P.,
Abouzar M. H.,
Poghossian A.,
Wagner T.,
Bijnens N.,
Williams O. A.,
Daenen M.,
Haenen K.,
Douhéret O.,
D'Haen J.,
Mekhalif Z.,
Schöning M. J.,
Wagner P.
Publication year - 2007
Publication title -
physica status solidi (a)
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.532
H-Index - 104
eISSN - 1862-6319
pISSN - 1862-6300
DOI - 10.1002/pssa.200776326
Subject(s) - nanocrystalline material , chemical vapor deposition , electrolyte , diamond , materials science , analytical chemistry (journal) , thin film , semiconductor , plasma enhanced chemical vapor deposition , capacitive sensing , capacitance , chemistry , nanotechnology , chemical engineering , electrode , optoelectronics , electrical engineering , composite material , chromatography , engineering
The pH‐sensitive properties of hydrogen‐ and oxygen‐terminated nanocrystalline diamond (NCD) films have been investigated using a field‐effect‐based capacitive electrolyte‐diamond‐insulator‐semiconductor (EDIS) structure as transducer. The NCD thin films (100–500 nm) were grown on p‐Si–SiO 2 substrates by microwave plasma‐enhanced chemical vapour deposition. The electrochemical characterisation of EDIS sensors with NCD films of different thicknesses has been performed in buffer solutions of pH 3 to pH 11 by means of capacitance–voltage and constant–capacitance methods. The developed EDIS sensors with O‐terminated NCD surfaces show an average pH‐sensitivity of 38 mV/pH. A slightly smaller pH‐sensitivity of 29–36 mV/pH was observed for the EDIS structure with H‐terminated NCD surfaces. (© 2007 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)