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Preparation of thin ferrite films on silicon using RF sputtering
Author(s) -
Koblischka M. R.,
Kirsch M.,
Brust M.,
KoblischkaVeneva A.,
Hartmann U.
Publication year - 2008
Publication title -
physica status solidi (a)
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.532
H-Index - 104
eISSN - 1862-6319
pISSN - 1862-6300
DOI - 10.1002/pssa.200723608
Subject(s) - materials science , sputtering , transmission electron microscopy , ferrite (magnet) , microstructure , annealing (glass) , crystallite , thin film , electron backscatter diffraction , magnetic force microscope , silicon , diffraction , atomic force microscopy , optoelectronics , analytical chemistry (journal) , composite material , metallurgy , nanotechnology , magnetization , optics , magnetic field , chemistry , physics , quantum mechanics , chromatography
Abstract Thin‐films of Ni x Zn 1– x Fe 2 O 4 [(Ni,Zn)‐ferrite] are grown by means of RF sputtering on Si(100) and (111) substrates, corresponding to the orientation of Si cantilevers for AFM/MFM measurements. We find that the ferrite can be sputtered directly onto the Si surfaces, but an additional annealing step is required to obtain a purely polycrystalline, soft magnetic film. The microstructure of the films is investigated employing transmission electron microscopy, electron backscatter diffraction and magnetic force microscopy. (© 2008 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)