Preparation of thin ferrite films on silicon using RF sputtering | Zendy

Koblischka M. R. | Zendy; Kirsch M. | Zendy; Brust M. | Zendy; KoblischkaVeneva A. | Zendy; Hartmann U. | Zendy

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Preparation of thin ferrite films on silicon using RF sputtering

Author(s) -

Koblischka M. R.,

Kirsch M.,

Brust M.,

KoblischkaVeneva A.,

Hartmann U.

Publication year - 2008

Publication title -

physica status solidi (a)

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.532

H-Index - 104

eISSN - 1862-6319

pISSN - 1862-6300

DOI - 10.1002/pssa.200723608

Subject(s) - materials science , sputtering , transmission electron microscopy , ferrite (magnet) , microstructure , annealing (glass) , crystallite , thin film , electron backscatter diffraction , magnetic force microscope , silicon , diffraction , atomic force microscopy , optoelectronics , analytical chemistry (journal) , composite material , metallurgy , nanotechnology , magnetization , optics , magnetic field , chemistry , physics , quantum mechanics , chromatography

Thin‐films of Ni x Zn 1– x Fe 2 O 4 [(Ni,Zn)‐ferrite] are grown by means of RF sputtering on Si(100) and (111) substrates, corresponding to the orientation of Si cantilevers for AFM/MFM measurements. We find that the ferrite can be sputtered directly onto the Si surfaces, but an additional annealing step is required to obtain a purely polycrystalline, soft magnetic film. The microstructure of the films is investigated employing transmission electron microscopy, electron backscatter diffraction and magnetic force microscopy. (© 2008 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)

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