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Strong enhancement of emissions from nanostructured ZnO thin films grown by plasma‐assisted molecular‐beam epitaxy on nanopored Si(001) substrates
Author(s) -
Choi JunHo,
Han Seok Kyu,
Hong SoonKu,
Song JungHoon,
Jeong Se Young,
Cho You Suk,
Kim Dojin,
Nam Yoon Sung,
Baek KyungSeon,
Chang SooKyung,
Yao Takafumi
Publication year - 2008
Publication title -
physica status solidi (a)
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.532
H-Index - 104
eISSN - 1862-6319
pISSN - 1862-6300
DOI - 10.1002/pssa.200723482
Subject(s) - materials science , nanostructure , molecular beam epitaxy , photoluminescence , substrate (aquarium) , thin film , nanotechnology , epitaxy , optoelectronics , etching (microfabrication) , plasma , chemical engineering , layer (electronics) , oceanography , physics , quantum mechanics , geology , engineering
Nanostructured ZnO films were fabricated on nanopored Si(001) surfaces through reactive ion etching and plasma‐assisted molecular‐beam epitaxy techniques. Nanowall‐like nanostructures were formed on the ZnO film surfaces depending on the thickness of the ZnO films. Significant enhancement of the photoluminescence intensity up to 15 fold was observed from the nanostructured ZnO films. We found that the emission properties of the film changed very sensitively with the nanostructure on the surface and the enhancement is closely related to the formations of nanostructures on the surface of the ZnO films, not at the interface between the films and the substrate. (© 2008 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)