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Optical and structural characteristics of tin oxide thin films deposited by filtered vacuum arc and spray pyrolysis
Author(s) -
Çetinörgü E.,
Gümüş C.,
Goldsmith S.,
Mansur F.
Publication year - 2007
Publication title -
physica status solidi (a)
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.532
H-Index - 104
eISSN - 1862-6319
pISSN - 1862-6300
DOI - 10.1002/pssa.200723081
Subject(s) - thin film , x ray photoelectron spectroscopy , materials science , analytical chemistry (journal) , crystallite , band gap , tin , tin oxide , vacuum arc , refractive index , deposition (geology) , oxide , chemistry , metallurgy , nanotechnology , chemical engineering , optoelectronics , cathode , engineering , paleontology , chromatography , sediment , biology
Tin oxide (SnO 2 ) thin films were deposited on commercial microscope glass and UV fused silica substrates (UVFS) using spray pyrolysis and filtered vacuum arc deposition (FVAD) system. During deposition, the substrates temperature was kept at 400 °C. The structure and composition were determined using X‐ray diffraction (XRD) and X‐ray photoelectron spectroscopy (XPS), respectively. The XRD patterns of SnO 2 thin films deposited with the two systems on hot substrates were found to be polycrystalline. The average transmission of the films in the VIS was 80% to 85%. The film optical constants were determined by normal incidence transmission measurements. The refractive indices of FVA deposited films were in the range 2.11 to 2.0, and those of spray deposited ones were 1.97 to 1.93. The extinction coefficients of the deposited films were in the range 0.29 and 0.11 to approximately 0 for FVAD and spray pyrolysis, respectively, depending on wavelengths. The optical band gap, E g , was determined from the dependence of the absorption coefficient on the photon energy at short wavelengths, and were 3.80 eV and 3.90 eV for spray pyrolysis and FVA deposited SnO 2 thin films, respectively. (© 2007 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)