X‐ray characterization of periodic sub‐nm surface relief gratings | Zendy

Zaumseil P. | Zendy; Birkholz M. | Zendy; Weidner G. | Zendy

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X‐ray characterization of periodic sub‐nm surface relief gratings

Author(s) -

Zaumseil P.,

Birkholz M.,

Weidner G.

Publication year - 2007

Publication title -

physica status solidi (a)

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.532

H-Index - 104

eISSN - 1862-6319

pISSN - 1862-6300

DOI - 10.1002/pssa.200675705

Subject(s) - x ray reflectivity , photoresist , diffraction , doping , materials science , diffraction grating , optics , lattice constant , lattice (music) , grating , ion , x ray crystallography , crystallography , optoelectronics , chemistry , physics , nanotechnology , thin film , layer (electronics) , organic chemistry , acoustics

Line and cross lattices of 260 and 360 nm pitch were prepared by covering p‐doped Si(100) substrates with photoresist, structuring and implanting with 3 × 10 15 cm –2 , 45 keV As + ions. These doping lattices with n + –p periodicity were investigated by X‐ray diffraction (XRD) and reflectivity (XRR). While XRD did not show any signal of the periodic structure, XRR revealed a clear periodic diffraction pattern related to the pitch of the doping lattice. The features of this pattern as a function of the lattice orientation are discussed in detail for the cross lattice. Atomic force microscopy showed that the measured diffraction pattern is caused by a surface relief grating with sub‐nm amplitude, which was generated by a final doping‐dependent etching step during sample preparation. (© 2007 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)

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