Premium
Combined double‐ and triple‐crystal X‐ray diffractometry with account for real defect structures in all crystals of X‐ray optical schemes
Author(s) -
Shpak A. P.,
Molodkin V. B.,
Olikhovskii S. I.,
Kyslovskyy Ye. M.,
Reshetnyk O. V.,
Vladimirova T. P.,
Len E. G.,
Nizkova A. I.,
Venger V. M.,
Dmitriev S. V.
Publication year - 2007
Publication title -
physica status solidi (a)
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.532
H-Index - 104
eISSN - 1862-6319
pISSN - 1862-6300
DOI - 10.1002/pssa.200675700
Subject(s) - monochromator , x ray , scattering , crystal (programming language) , crystallography , dislocation , silicon , materials science , single crystal , optics , molecular physics , physics , chemistry , optoelectronics , computer science , wavelength , programming language
Analytical expressions for coherent and diffuse scattering intensities with account for imperfections in all the crystals of double‐ and triple‐crystal diffractometers (DCD and TCD) have been derived from the generalized dynamical theory of X‐ray scattering in real single crystals which contain microdefects of various types. The analysis of TCD and DCD profiles measured from Czochralski‐grown silicon single crystal with oxygen precipitates and dislocation loops has been carried out. Characteristics of defect structures in sample and monochromator have been determined by using the combined DCD+TCD method. (© 2007 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)