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A magnetron sputter deposition chamber for in‐situ investigation of multilayer film growth using a state of the art Laboratory Diffractometer
Author(s) -
Ringpfeil Clemens,
LützenkirchenHecht Dirk,
Frahm Ronald
Publication year - 2007
Publication title -
physica status solidi (a)
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.532
H-Index - 104
eISSN - 1862-6319
pISSN - 1862-6300
DOI - 10.1002/pssa.200675691
Subject(s) - diffractometer , sputter deposition , materials science , wafer , amorphous solid , thin film , deposition (geology) , cavity magnetron , bilayer , diffraction , optics , sputtering , analytical chemistry (journal) , optoelectronics , composite material , crystallography , nanotechnology , chemistry , scanning electron microscope , physics , paleontology , biochemistry , sediment , membrane , biology , chromatography
An Fe 2 O 3 –Al 2 O 3 bilayer film was prepared on a Si(111)‐wafer by sputter deposition in a vacuum chamber with two integrated small magnetron sources and in‐situ investigated using grazing incidence X‐ray reflectivity, X‐ray scattering and X‐ray diffraction experiments. We will present details of the new cell and present first results of the prepared Fe 2 O 3 –Al 2 O 3 thin films, which exhibit an amorphous film structure with a reduced density and a roughness increasing with film thickness. (© 2007 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)