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Optical measurement of carrier concentration profile in n‐type semiconducting GaAs substrate
Author(s) -
Kitamoto Takuya,
Inoue Yusuke,
Yamada Masayoshi,
Kawase Tomohiro
Publication year - 2007
Publication title -
physica status solidi (a)
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.532
H-Index - 104
eISSN - 1862-6319
pISSN - 1862-6300
DOI - 10.1002/pssa.200674160
Subject(s) - transmittance , free carrier absorption , absorption (acoustics) , materials science , band gap , homogeneity (statistics) , substrate (aquarium) , optoelectronics , wavelength , doping , attenuation coefficient , analytical chemistry (journal) , optics , chemistry , statistics , oceanography , mathematics , physics , chromatography , composite material , geology
The light absorption below the fundamental energy gap in n‐type GaAs has been investigated precisely. It is experimentally confirmed that there are the three different mechanisms: (a) the enhancement of fundamental absoption due to the shrinkage of energy gap and band filling by doping Si atoms, (b) deep‐level (EL2) absorption, and (c) free‐carrier absorption. It is found that the transmittance measurement at the wavelength longer than about 1000 nm in the free‐carrier absorption region is more useful and direct, compared with that near the fundamental absorption region from 900 nm to 950 nm, precisely to determine the carrier concentration in n‐type GaAs. The two‐dimensional profile of carrier concentration in a VB‐grown 3 ϕ GaAs substrate is measured in high spatial resolution with the short time less than 5 seconds by using a sophisticated near‐infrared transmittance‐measuring equipment. The absolute amount and homogeneity of carrier concentration can be assessed in the range from 0.3 to 3 × 10 18 cm –3 . (© 2007 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)