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High giant magnetoresistance in electrodeposited Cu/Co nano‐multilayers
Author(s) -
Gupta Priyanka,
Pandya Dinesh K.,
Kashyap Subhash C.,
Chaudhary Sujeet
Publication year - 2007
Publication title -
physica status solidi (a)
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.532
H-Index - 104
eISSN - 1862-6319
pISSN - 1862-6300
DOI - 10.1002/pssa.200622611
Subject(s) - giant magnetoresistance , bilayer , materials science , magnetoresistance , stack (abstract data type) , cyclic voltammetry , nano , deposition (geology) , analytical chemistry (journal) , magnetic field , condensed matter physics , nanotechnology , chemistry , electrode , electrochemistry , membrane , composite material , paleontology , biochemistry , physics , quantum mechanics , chromatography , sediment , computer science , biology , programming language
Nano‐multilayers of Cu(6 nm)/Co(∼22 nm) have been electrodeposited in potentiostatic pulse mode on ITO coated glass substrates. Cyclic voltammetry and chronoamperometric studies were performed to determine the potential and duration for the deposition of individual layers. A 50‐bilayer stack exhibited a room temperature GMR of 12.5%, at 8 kOe. Even at low fields of ∼3 kOe, this multilayer exhibited ∼10% GMR, thereby demonstrating the potential application of electrodeposition (ED) process in achieving appreciable value of GMR at room temperature and at lower field values. The observed high value of GMR at room temperature may be attributed to the antiferromagnetically (AF) aligned magnetic layers in the absence of magnetic field. (© 2007 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)