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Laser‐doping of silicon carbide for p–n junction and LED fabrication
Author(s) -
Bet Sachin,
Quick Nathaniel,
Kar Aravinda
Publication year - 2007
Publication title -
physica status solidi (a)
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.532
H-Index - 104
eISSN - 1862-6319
pISSN - 1862-6300
DOI - 10.1002/pssa.200622466
Subject(s) - materials science , doping , dopant , optoelectronics , silicon carbide , electroluminescence , wafer , diode , p–n junction , laser , silicon , semiconductor , optics , nanotechnology , metallurgy , physics , layer (electronics)
The high melting point and the limited diffusion of impurities in silicon carbide have greatly restricted the use of conventional ion implantation and furnace to incorporate and activate dopants. A laser doping technique overcomes these obstacles for doping silicon carbide and other wide band gap semiconductors. This paper presents the work on fabrication of p–n junction diodes and blue light emitting diodes using laser doping technique. A p–n junction was created by laser doping a silicon carbide wafer with aluminum (p‐type) and nitrogen (n‐type). Optical interferometer profilometer scan showed that there was no damage on the surface post laser doping. Secondary ion mass spectrometry (SIMS) was carried to estimate the dopant concentration and depth. The effects of laser doping on the current–voltage characteristics were studied. The junctions were characterized by capacitance–voltage and electroluminescence measurements. A broad electroluminescence peak was observed around 498.8 nm wavelength, characterizing the p–n junction as a blue light‐emitting diode. (© 2007 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)