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Integrating nanotubes into microsystems with electron beam lithography and in situ catalytically activated growth
Author(s) -
Gjerde K.,
Mora M. F.,
KjelstrupHansen J.,
Schurmann T.,
Gammelgaard L.,
Aono M.,
Teo K. B. K,
Milne W. I.,
Bøggild P.
Publication year - 2006
Publication title -
physica status solidi (a)
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.532
H-Index - 104
eISSN - 1862-6319
pISSN - 1862-6300
DOI - 10.1002/pssa.200566181
Subject(s) - microfabrication , microsystem , nanotechnology , materials science , carbon nanotube , electron beam lithography , lithography , fabrication , cleanroom , resist , optoelectronics , medicine , alternative medicine , pathology , layer (electronics)
Integration of freestanding wire‐like structures such as multi walled carbon nanotubes (MWCNT) into microsystems has many potential applications. Devices such as AFM tips or improved electrodes for conductivity measurements are obvious candidates. Catalytically activated growth opens up the possibility of waferscale fabrication of such devices. We combine conventional microfabrication techniques with state of the art electron beam lithography (EBL) to precisely position catalyst nanoparticles with sub 100 nm diameter into the microsystems. In particular, we have explored two main approaches which allow the catalyst material deposition to occur after the microfabrication is finished, thus avoiding contamination of cleanroom equipment. (© 2006 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)