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Ion‐assisted nanorod growth by dc magnetron sputtering
Author(s) -
Rogov A. V.,
Fanchenko S. S.,
Varfolomeev A. E.
Publication year - 2005
Publication title -
physica status solidi (a)
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.532
H-Index - 104
eISSN - 1862-6319
pISSN - 1862-6300
DOI - 10.1002/pssa.200521217
Subject(s) - nanorod , sputtering , cathode , sputter deposition , materials science , argon , molybdenum , graphite , crystallite , analytical chemistry (journal) , optoelectronics , nanotechnology , chemistry , thin film , atomic physics , metallurgy , physics , chromatography
Abstract High‐rate cathode growth of nanorods is observed for dc magnetron sputtering of graphite, germanium and molybdenum cathodes despite the sputtering. The growth of vertically aligned carbon nanorods using dc magnetron sputtering with deuterium as the working gas and a polycrystalline nuclear graphite cathode is reported for the first time. Two different types of carbon nanorodes are observed differing in their diameter/length ratio. High‐rate nanorod growth is also observed for the usual magnetron sputtering with argon as a working gas for molybdenum and germanium single‐crystal cathodes. The high growth rate (tens of micrometres per hour) is discussed in the context of ion‐stimulated surface mobility of the neutral atoms and their redeposition in nonhomogeneous cathode sputtering. (© 2005 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)