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Effect of substrate temperature on the physical properties of dc magnetron sputtered Cu 2 O films
Author(s) -
Sivasankar Reddy A.,
Sreedhara Reddy P.,
Uthanna S.,
Venkata Rao G.,
Klein A.
Publication year - 2006
Publication title -
physica status solidi (a)
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.532
H-Index - 104
eISSN - 1862-6319
pISSN - 1862-6300
DOI - 10.1002/pssa.200521032
Subject(s) - substrate (aquarium) , materials science , deposition (geology) , cavity magnetron , atmospheric temperature range , sputter deposition , cathode , analytical chemistry (journal) , oxide , absorption (acoustics) , sputtering , thin film , chemical engineering , chemistry , nanotechnology , composite material , metallurgy , thermodynamics , paleontology , oceanography , physics , chromatography , sediment , engineering , biology , geology
Cuprous oxide (Cu 2 O) films were formed by dc reactive magnetron sputtering onto glass substrates held at various temperatures in the range 303–648 K. The substrate temperature was found to be an important parameter in controlling the physical properties of the deposited films. The variation of cathode potential and deposition rate with the substrate temperature was studied. The dependence of crystallographic structure, electrical properties and optical absorption of the films on the substrate temperature was systematically investigated. (© 2006 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)