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Formation technique for macroporous morphology superlattice
Author(s) -
Zheng J.,
Christophersen M.,
Bergstrom P. L.
Publication year - 2005
Publication title -
physica status solidi (a)
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.532
H-Index - 104
eISSN - 1862-6319
pISSN - 1862-6300
DOI - 10.1002/pssa.200461214
Subject(s) - superlattice , materials science , etching (microfabrication) , porous silicon , macropore , anodizing , morphology (biology) , silicon , microelectromechanical systems , porosity , nanotechnology , chemical engineering , optoelectronics , chemistry , composite material , organic chemistry , catalysis , layer (electronics) , mesoporous material , aluminium , biology , engineering , genetics
Abstract In this work, the investigators studied etching conditions for generating macro porous silicon with different morphologies in p‐type (111) substrates. Both crystal orientation dependent growth of macropores and electric current direction dependent growth of macropores have been achieved. A superlattice structure, which consists of several layers of macroporous silicon with different morphologies, has been demonstrated by modulating the etch conditions during the anodization process. The morphology superlattice structure is developed for an inlet particle filter of a micro gas chromatograph (µGC). It may offer a number of other new MEMS applications. (© 2005 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)