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Pore formation on p‐type InP(100)
Author(s) -
Schlierf U.,
Lockwood D. J.,
Graham M. J.,
Schmuki P.
Publication year - 2005
Publication title -
physica status solidi (a)
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.532
H-Index - 104
eISSN - 1862-6319
pISSN - 1862-6300
DOI - 10.1002/pssa.200461133
Subject(s) - electropolishing , anodizing , electrolyte , electrochemistry , layer (electronics) , porosity , oxide , ion , chemical engineering , materials science , chemistry , inorganic chemistry , nanotechnology , metallurgy , composite material , organic chemistry , electrode , aluminium , engineering
The present work deals with anodization processes of p‐type InP(100) in different halogenic acids. The morphology of the attack depends strongly on the electrochemical conditions and the type of anion present in the electrolyte. Only electropolishing was observed in HCl while the formation of a porous oxide layer was obtained in HF. In HBr, however, pore growth into the bulk material can be achieved. (© 2005 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)