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Silicon based optical devices – photonic applications of anisotropically nanostructured silicon
Author(s) -
Diener J.,
Künzner N.,
Gross E.,
Kovalev D.,
Fujii M.
Publication year - 2005
Publication title -
physica status solidi (a)
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.532
H-Index - 104
eISSN - 1862-6319
pISSN - 1862-6300
DOI - 10.1002/pssa.200461124
Subject(s) - materials science , polarizer , porous silicon , silicon , optoelectronics , dichroic glass , wafer , photonics , etching (microfabrication) , optics , silicon photonics , planar , refractive index , polarization (electrochemistry) , anisotropy , birefringence , nanotechnology , chemistry , physics , computer graphics (images) , layer (electronics) , computer science
Anisotropic nanostructuring of bulk silicon (Si) wafers leads to a significant in‐plane optical anisotropy of single porous silicon (PSi) layers. Additionally a variation of the etching current in time allows a controlled modification of the porosity along the growth direction and therefore a three‐dimensional variation of the refractive index (in‐plane and in‐depth). This technique can be important for photonic applications since it is the basis of a development of a variety of novel, polarization‐sensitive, silicon‐based optical devices: retarders, dichroic Bragg reflectors, dichroic microcavities and planar Si‐based polarizers. (© 2005 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)