Silicon based optical devices – photonic applications of anisotropically nanostructured silicon | Zendy

Diener J. | Zendy; Künzner N. | Zendy; Gross E. | Zendy; Kovalev D. | Zendy; Fujii M. | Zendy

AI Assistant Blog Pricing

Home ZAIA Blog

Premium

Silicon based optical devices – photonic applications of anisotropically nanostructured silicon

Author(s) -

Diener J.,

Künzner N.,

Gross E.,

Kovalev D.,

Fujii M.

Publication year - 2005

Publication title -

physica status solidi (a)

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.532

H-Index - 104

eISSN - 1862-6319

pISSN - 1862-6300

DOI - 10.1002/pssa.200461124

Subject(s) - materials science , polarizer , porous silicon , silicon , optoelectronics , dichroic glass , wafer , photonics , etching (microfabrication) , optics , silicon photonics , planar , refractive index , polarization (electrochemistry) , anisotropy , birefringence , nanotechnology , chemistry , physics , computer graphics (images) , layer (electronics) , computer science

Anisotropic nanostructuring of bulk silicon (Si) wafers leads to a significant in‐plane optical anisotropy of single porous silicon (PSi) layers. Additionally a variation of the etching current in time allows a controlled modification of the porosity along the growth direction and therefore a three‐dimensional variation of the refractive index (in‐plane and in‐depth). This technique can be important for photonic applications since it is the basis of a development of a variety of novel, polarization‐sensitive, silicon‐based optical devices: retarders, dichroic Bragg reflectors, dichroic microcavities and planar Si‐based polarizers. (© 2005 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)

This content is not available in your region!

Continue researching here.

Having issues? You can contact us here

Accelerating Research