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Fabrication of self‐aligned gated silicon microtip array using electrochemical silicon etching
Author(s) -
Barillaro G.,
D'Angelo F.,
Pennelli G.,
Pieri F.
Publication year - 2005
Publication title -
physica status solidi (a)
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.532
H-Index - 104
eISSN - 1862-6319
pISSN - 1862-6300
DOI - 10.1002/pssa.200461121
Subject(s) - fabrication , etching (microfabrication) , silicon , materials science , nanotechnology , optoelectronics , reactive ion etching , engraving , composite material , medicine , alternative medicine , layer (electronics) , pathology
In this paper we report a new approach to fabricate gated silicon microtip arrays for field emission applications using a single mask process. The key role in the fabrication process is played by the photoelectrochemical etching of silicon in HF‐based electrolytes. This technique is here exploited to produce highly uniform silicon microtip arrays. The fabrication process is detailed and the dependence of the tip geometry on the electrochemical etching parameters is discussed. (© 2005 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)