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Gasochromic tungsten oxide‐based film structures
Author(s) -
Nowoczin J.,
Shanak H.,
Ziebert C.,
Schmitt H.,
Ehses K. H.
Publication year - 2005
Publication title -
physica status solidi (a)
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.532
H-Index - 104
eISSN - 1862-6319
pISSN - 1862-6300
DOI - 10.1002/pssa.200420017
Subject(s) - tungsten , molybdenum , sputtering , thin film , materials science , oxygen , oxide , tungsten oxide , sputter deposition , chemical engineering , deposition (geology) , inorganic chemistry , metallurgy , nanotechnology , chemistry , paleontology , organic chemistry , sediment , engineering , biology
Tungsten oxide thin films were produced by reactive sputter deposition which is an advantageous method because of the opportunity to influence the properties of the films by several parameters. This work focuses on the influence of the oxygen content during the sputtering process and on mixed tungsten and molybdenum oxide films. The oxygen content has a great influence on the film growth velocity and leads to significant differences in crystal symmetry as a function of oxygen partial pressure. Additionally an influence of oxygen content on the gasochromic behaviour was observed. The mixed tungsten molybdenum oxide thin films show no change in the velocity of the gasochromic colouration but the fact that the coloured films show high absorption all over the visible region of the optical spectrum is a significant advantage. (© 2005 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)