Premium
A novel method for preparing microcrystalline films from the amorphous phase by shot‐like IR laser light irradiation
Author(s) -
Kondo S.,
Saito T.
Publication year - 2005
Publication title -
physica status solidi (a)
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.532
H-Index - 104
eISSN - 1862-6319
pISSN - 1862-6300
DOI - 10.1002/pssa.200406930
Subject(s) - microcrystalline , materials science , crystallite , amorphous solid , luminescence , mesoscopic physics , irradiation , thin film , crystal (programming language) , chemical engineering , crystallization , optoelectronics , optics , nanotechnology , crystallography , chemistry , condensed matter physics , metallurgy , physics , engineering , computer science , nuclear physics , programming language
A novel method is presented for preparing microcrystalline films of metal halide semiconductors. The method is based on fast crystallization and subsequent crystal growth of amorphous films by means of shot‐like IR laser light irradiation and includes in situ monitoring of exciton luminescence. It is possible to prepare high‐quality microcrystalline films at various size levels of the crystallites. There is an optimum size level at which the microcrystalline films show much stronger free‐exciton luminescence than polycrystalline films and bulk single crystals (as exemplified for CuCl and CsPbCl 3 ). The microcrystalline films provide extremely densely dispersed nanoparticles for studying mesoscopic enhancement of linear and nonlinear optical properties at various particle size levels. (© 2005 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)