Electrochemical deposition and characterization of CoFe 2 O 4  thin films | Zendy

Sartale S. D. | Zendy; Lokhande C. D. | Zendy; Ganesan V. | Zendy

AI Assistant Blog Pricing

Home ZAIA Blog

Premium

Electrochemical deposition and characterization of CoFe 2 O 4 thin films

Author(s) -

Sartale S. D.,

Lokhande C. D.,

Ganesan V.

Publication year - 2005

Publication title -

physica status solidi (a)

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.532

H-Index - 104

eISSN - 1862-6319

pISSN - 1862-6300

DOI - 10.1002/pssa.200406898

Subject(s) - materials science , crystallite , annealing (glass) , spinel , thin film , ethylene glycol , deposition (geology) , electrochemistry , anodizing , chemical engineering , nanotechnology , metallurgy , chemistry , electrode , aluminium , paleontology , sediment , engineering , biology

An electrochemical deposition process, which is a combination of electrodeposition of CoFe 2 alloy from an ethylene glycol bath followed by its anodization at ambient temperature, is used to deposit CoFe 2 O 4 thin films on different conducting substrates. Various deposition conditions are studied and optimized. The films have spinel CoFe 2 O 4 structure with crystallite size less than 50 nm. The films are adherent and covered the substrates well. The films are annealed in air at 500 °C for 1 h and the observed properties are reported. After annealing the films have smooth and compact surfaces with improved magnetic properties. (© 2005 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)

This content is not available in your region!

Continue researching here.

Having issues? You can contact us here

Accelerating Research