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Electrochemical deposition and characterization of CoFe 2 O 4 thin films
Author(s) -
Sartale S. D.,
Lokhande C. D.,
Ganesan V.
Publication year - 2005
Publication title -
physica status solidi (a)
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.532
H-Index - 104
eISSN - 1862-6319
pISSN - 1862-6300
DOI - 10.1002/pssa.200406898
Subject(s) - materials science , crystallite , annealing (glass) , spinel , thin film , ethylene glycol , deposition (geology) , electrochemistry , anodizing , chemical engineering , nanotechnology , metallurgy , chemistry , electrode , aluminium , paleontology , sediment , engineering , biology
An electrochemical deposition process, which is a combination of electrodeposition of CoFe 2 alloy from an ethylene glycol bath followed by its anodization at ambient temperature, is used to deposit CoFe 2 O 4 thin films on different conducting substrates. Various deposition conditions are studied and optimized. The films have spinel CoFe 2 O 4 structure with crystallite size less than 50 nm. The films are adherent and covered the substrates well. The films are annealed in air at 500 °C for 1 h and the observed properties are reported. After annealing the films have smooth and compact surfaces with improved magnetic properties. (© 2005 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)