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Insecticide resistance traits differ among and within host races in Aphis gossypii
Author(s) -
Carletto Jérôme,
Martin Thibaud,
VanlerbergheMasutti Flavie,
Brévault Thierry
Publication year - 2010
Publication title -
pest management science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.296
H-Index - 125
eISSN - 1526-4998
pISSN - 1526-498X
DOI - 10.1002/ps.1874
Subject(s) - aphis gossypii , biology , aphid , host (biology) , aphididae , botany , pest analysis , horticulture , genetics , homoptera
BACKGROUND: The polyphagous cotton‐melon aphid Aphis gossypii Glover is structured into geographically widespread host races comprising a few clones specialised on Cucurbitaceae, cotton, eggplant or pepper. To assess insecticide resistance among and within host races, leaf disc bioassays were conducted on aphid clones collected from Cucurbitaceae (genotypes C4 and C9 ), cotton (genotypes Burk and Ivo ), eggplant (genotype Auber ) and pepper (genotype PsP4 ). Molecular diagnostic (PCR‐RFLP) and enzyme assays were also performed to detect the basic mechanisms underlying insecticide resistance. RESULTS: All six clones were susceptible to acetamiprid (neonicotinoid) or carbosulfan (carbamate). Conversely, all clones were resistant to dimethoate (organophosphate) (RF = 4.1–38.1) and carried mutation S431F in the acetylcholinesterase gene. Auber, PsP4 and Burk also carried mutation A302S in this gene, which possibly conferred moderate resistance (RF = 3.7–6.8) to profenofos and monocrotophos (organophosphates). Auber and Burk were highly resistant (RF = 41.2 and 473 respectively) to cypermethrin (pyrethroid). This resistance was likely associated with point mutation super‐ kdr (M918L) in the voltage‐gated sodium channel gene (para gene) or metabolic detoxification mediated by esterase and oxidase enzymes. CONCLUSION: Multiple resistance to a broad range of insecticides and multiple mechanisms of resistance in some clones could explain to some extent the low genetic diversity observed within A. gossypii host races. Copyright © 2009 Society of Chemical Industry