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Monitoring neonicotinoid resistance in biotype B of Bemisia tabaci in Florida
Author(s) -
Schuster David J,
Mann Rajinder S,
Toapanta Marco,
Cordero Roberto,
Thompson Sandra,
Cyman Sabrina,
Shurtleff Aaron,
Morris II Roy F
Publication year - 2010
Publication title -
pest management science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.296
H-Index - 125
eISSN - 1526-4998
pISSN - 1526-498X
DOI - 10.1002/ps.1853
Subject(s) - thiamethoxam , imidacloprid , neonicotinoid , biology , pest analysis , toxicology , whitefly , pesticide , veterinary medicine , agronomy , botany , medicine
BACKGROUND: Biotype B of the sweetpotato whitefly, Bemisia tabaci (Genn.), is a worldwide pest that has developed resistance to many insecticides, including the neonicotinoid class. Florida field populations were monitored for susceptibility to the neonicotinoids imidacloprid and thiamethoxam using a cut leaf petiole bioassay method. RESULTS: Average RR 50 values for imidacloprid increased from 3.7 in 2000 to 12.0 in 2003; decreased to 5.0 and 2.5 in 2004 and 2005, respectively; and then increased to 26.3 and 23.9 in 2006 and 2007, respectively. Populations with RR 50 values of about 50 to 60 during generation one reverted to RR 50 values of ⩽4 in six generations, when reared without further exposure to imidacloprid. Average RR 50 values for thiamethoxam increased from 2.0 in 2003 to 24.7 in 2006 and decreased to 10.4 in 2007. Populations with RR 50 values of about 22, 32 and 53 during generation one declined to 8, 5 and 6, respectively, after being reared for five generations without exposure to thiamethoxam. The correlation coefficient from the 26 populations that were bioassayed both with imidacloprid and thiamethoxam showed a significant positive correlation ( R 2 = 0.58) between these populations. CONCLUSION: The high level of RR 50 values to imidacloprid and thiamethoxam suggest an unstable decline in the susceptibility of B. tabaci to imidacloprid and thiamethoxam, with possible cross‐resistance or predisposition for dual resistance selection. Copyright © 2009 Society of Chemical Industry