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Reflection Phenomena in Particle Sizing by static and dynamic light scattering
Author(s) -
De Meulenaer Bruno,
Van der Meeren Paul,
Vanderdeelen Jan,
Baert Leon
Publication year - 1996
Publication title -
particle and particle systems characterization
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.877
H-Index - 56
eISSN - 1521-4117
pISSN - 0934-0866
DOI - 10.1002/ppsc.19960130211
Subject(s) - dynamic light scattering , sizing , reflection (computer programming) , optics , cuvette , light scattering , scattering , dispersion (optics) , particle (ecology) , dispersity , materials science , particle size , total internal reflection , particle size distribution , physics , chemistry , nanotechnology , computer science , nanoparticle , polymer chemistry , geology , oceanography , organic chemistry , programming language
Abstract Using a monodisperse poly(methyl methacrylate) dispersion it was shown that light reflection at the sample cuvette walls may greatly influence the results of both static (SLS) and dynamic (DLS) light scattering experiments. Considering SLS, this reflection phenomenon mostly causes an overestimation of the scattered intensity at high scattering angles, which may give rise to the emergence of an additional, artificial peak in the lower region of the particle size distribution. On the other hand, the influence of reflection on DLS experiments was shown to be particularly important in the upper region of the particle size distribution. The experimentally observed phenomena were explained from basic principles of both particle sizing methods. Finally, it was shown that the disturbing effect of reflection could be avoided by modifying either the hardware or the software of the SLS and DLS techniques.