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Novel gas aggregation cluster source based on post magnetron
Author(s) -
Nikitin Daniil,
Hanuš Jan,
Pleskunov Pavel,
Krtouš Zdeněk,
AliOgly Suren,
Tafiichuk Renata,
Biliak Kateryna,
Protsak Mariia,
Valter Jan,
Vyskočil Jiři,
Choukourov Andrei,
Biederman Hynek
Publication year - 2021
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.202100068
Subject(s) - copper , cavity magnetron , cluster (spacecraft) , nanoparticle , sputter deposition , deposition (geology) , argon , volumetric flow rate , rotation (mathematics) , materials science , flow (mathematics) , chemical physics , nanotechnology , chemical engineering , analytical chemistry (journal) , optoelectronics , mechanics , chemistry , atomic physics , thin film , physics , sputtering , computer science , chromatography , metallurgy , engineering , paleontology , sediment , biology , programming language , artificial intelligence
In this communication, a new gas aggregation cluster source is introduced equipped with post cylindrical magnetron. The rotation of magnetic circuit improves the usage of cylindrical copper target in terms of its homogenous consumption. Copper nanoparticles were successfully synthesized. Their deposition rate fluctuates at slow rotations of magnetic circuit. Cyclic trapping and release of nanoparticles from electrostatic capture zones are likely responsible for this effect. The instabilities are not observed at higher rotation speeds. The argon flow is found to be very complex within the cluster source; however, it seems crucial for its operation. The efficiency of transport of nanoparticles and their size increase with gas flow. The highest values of deposition rate of around 19 mg/h are obtained.