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Comparison of HMDSO and HMDSN as precursors for high‐barrier plasma‐polymerized multilayer coating systems on polyethylene terephthalate films
Author(s) -
Jaritz Montgomery,
Alizadeh Philipp,
Wilski Stefan,
Kleines Lara,
Dahlmann Rainer
Publication year - 2021
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.202100018
Subject(s) - hexamethyldisiloxane , materials science , organosilicon , polyethylene terephthalate , coating , plasma polymerization , barrier layer , composite material , layer (electronics) , polyethylene , silicon oxide , silicon , nanometre , contact angle , surface energy , surface roughness , plasma , chemical engineering , surface finish , polymerization , polymer chemistry , polymer , optoelectronics , silicon nitride , physics , quantum mechanics , engineering
Hexamethyldisiloxane (HMDSO)‐ and hexamethyldisilazane (HMDSN)‐based plasma polymeric coatings are compared as elements of multilayer barrier coatings, consisting of an alternating structure of organosilicon and silicon oxide layers. Furthermore, these coatings are examined with regard to their deposition rate, critical layer thickness, surface roughness, atomic composition, and gas permeability. It is investigated how these attributes correlate in the overall barrier performance of a multilayer coating system. The concluded examinations show that HMDSN delivers best overall barrier performances as a precursor at high energy densities. For lower energy densities, the use of HMDSO is preferable. Intermediate layer thickness should not exceed six nanometers for best barrier performance in the given experiment configuration.