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Non‐self‐sustained electron beam RF‐generated plasma in application for functional surface pretreatment
Author(s) -
Palov Alexander P.,
Proshina Olga V.,
Rakhimova Tatyana V.,
Rakhimov Alexander T.,
Voronina Ekateri.
Publication year - 2021
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.202100007
Subject(s) - biasing , trench , plasma , ion , torr , atomic physics , materials science , monte carlo method , electron , voltage , beam (structure) , particle in cell , plasma parameters , ion beam , molecular physics , chemistry , optics , physics , nanotechnology , statistics , mathematics , organic chemistry , layer (electronics) , quantum mechanics , thermodynamics
Simulation of non‐self‐sustained plasma generated by a 2‐keV electron beam in Ar with radiofrequency (RF) biasing is carried out using a one‐dimensional particle‐in‐cell Monte Carlo method. The effect of 10–30 mTorr gas pressure and different RF voltages of 0–45 V on the ion energy and angle distribution functions is analyzed and discussed. The performed ab initio dynamic simulations confirmed the possibility to eliminate methyl groups from the low‐ k surfaces with low‐energy (10–20 eV) Ar ions, thereby turning these surfaces from hydrophobic into hydrophilic. The analytical model is developed to calculate the ion fluxes on two‐dimensional trench walls and bottom for conditions under study. It was shown that plasma with a pressure of 10 mTorr and a bias voltage of ≤45 V is better suited for pretreatment of the low‐ k trench walls.