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Inside Front Cover Picture: Plasma Process. Polym. 7/2020
Author(s) -
Abessolo Ondo Dominique,
Leturcq Renaud,
Boscher Nicolas D.
Publication year - 2020
Publication title -
plasma processes and polymers
Language(s) - English
Resource type - Reports
SCImago Journal Rank - 0.644
H-Index - 74
eISSN - 1612-8869
pISSN - 1612-8850
DOI - 10.1002/ppap.202070016
Subject(s) - materials science , dielectric , monomer , polymer , polymer chemistry , diffusion , adsorption , radical , nanosecond , plasma , chemical engineering , analytical chemistry (journal) , composite material , chemistry , thermodynamics , optics , organic chemistry , optoelectronics , laser , quantum mechanics , physics , engineering
Inside Front Cover : Low‐k polymer insulating layers films are produced at atmospheric‐pressure from the nanosecond pulsed plasma reaction of cyclic vinyl organosiloxanes. Variation of the monomer saturation ratio, PM/Psat, impacts the diffusion and adsorption of primary radicals and monomers from the vapour phase to the surface where the polymerisation occurs. Changes in the growth mechanisms affect the dielectric strength and dielectric constant of the formed layers. Further details can be found in the article by Dominique Abessolo Ondo, Renaud Leturcq, Nicolas D. Boscher ( e2000032 ).